December 1, 2009 (FinancialWire) — Axcelis Technologies, Inc. (NASDAQ: ACLS) announced the introduction of the Optima HDx high dose implanter, which brings unprecedented beam current and performance levels to the high dose space.

An extension of the company’s Optima HD platform, the Optima HDx has been designed to provide chipmakers dramatically increased productivity and capital efficiency. The system is the latest tool in Axcelis’ versatile Optima implant family, and is available now for shipment.

The new Optima HDx features a unique combination of enhancements to maximize beam current, minimize beam set up time and eradicate energy contamination to deliver the most precise and repeatable performance in the high dose space. The system’s unique spot beam technology and short beamline deliver the industry’s highest drift beam currents up to 36mA, or 38%, higher than its competitors.

To further enhance performance, its patented AutoTune beam tuning system has significantly accelerated both tune times and success rates, providing up to a 60% advantage over competitive systems, for increased fab productivity. Key to the systems enabling technology is the proprietary RadiusScan, which ensures the best across-wafer dose and angle process uniformity, as well as repeatability.

The products are slated to be shown at the upcoming SEMICON Japan, on December 2-4th, at the Makuhari Messe in Chiba, Japan. Visit booth #2B-401.

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