Entegris Offers New Contamination Measurement Tools
If left uncontrolled, these low molecular weight, silicon-containing organic compounds (such as TMS) have been shown to impact 248 nm and 193 nm exposure tools, and can lead to permanent damage of sensitive and costly optical components.
Entegris says it is one of a few companies worldwide with analytical service capabilities to accurately sample and analyze these contaminants in the fab environment. Manufacturers of scanner tools have already mandated the measurement of high molecular weight contaminants, but until now, there has been no means for fabs to reliably identify and quantify the presence of the low molecular weight variety. Together with this lab's ISO 17025 accredited analytical services, Entegris' advanced filtration and purification products provide solutions that identify, measure, and then control airborne molecular contamination.
"We are now able to accurately and reliably see and control low molecular weight silicon contamination as well as some high molecular weight compounds such as HMDSO and D3, which have been difficult to measure," said Jurgen Lobert, director of Entegris Analytical Services. "As the preferred partner for OEM compliance and product validation measurements for ASML and Nikon, which require users of their tools to measure low and high molecular weight silicon compounds, we now offer a powerful solution for fabs. This will allow OEMs to further reduce lithography process contamination that can impact yields and shorten the lives of critical manufacturing components."
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