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TSI Hosts Webinar On Nanotechnology Emission Assessment Technique (NEAT)

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Experts Come Together to Discuss Nanotechnology at Free Webinar Hosted by TSI's Acclaimed Global Aerosol Education Webinar Series

/EINPresswire.com/Shoreview, MN- On February 2, 2012, experts in the field of nanoparticle and aerosol research will come together to discuss background information, present implementation options, and answer questions for any and all interested in this ever more important topic in the free webinar "Nanotechnology Emission Assessment Technique (NEAT)" hosted by TSI's acclaimed Global Aerosol Education Webinar Series.

Nanotechnology has been hailed as the next industrial revolution due to the novel electrical, catalytic, magnetic, mechanical, thermal, and optical properties of nanoparticles. However, the human health risks, if any, of engineered nanoparticle (ENP) exposure are unknown, and currently there are few exposure limits set for nanoparticle emissions. Despite this, many organizations involved in ENP research and manufacturing believe it is prudent to perform a baseline assessment of worker air quality. As a guideline, the National Institute for Occupational Safety and Health (NIOSH) has developed the Nanotechnology Emission Assessment Technique (NEAT).

The webinar is free to attend and will be presented live at three different times to accommodate global time zones.

For more information on this event and to register, visit: www.tsi.com/webinars.

About TSI Incorporated
TSI Incorporated serves a global market by investigating, identifying and solving measurement problems. As an industry leader in the design and production of precision instruments, TSI partners with research institutions and customers around the world to set the standard for measurements relating to aerosol science, air flow, health and safety, indoor air quality, fluid dynamics and biohazard detection.

Media Contact:
Danielle Ziemer
TSI Incorporated
8008742811
http://www.tsi.com/




PR courtesy of Online PR Media: http://bit.ly/zKVOmo


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